KLA-Tencor Introduces Key Systems for 5D™ Patterning Control Solution (NASDAQ:KLAC)

MILPITAS, Calif., Aug. 26, 2014 /PRNewswire/ -- Today, KLA-Tencor Corporation (NASDAQ: KLAC) introduced the WaferSight™ PWG patterned wafer geometry measurement system, the LMS IPRO6 reticle pattern placement metrology system and the K-T Analyzer^® 9.0 advanced data analysis system. These three new products support KLA-Tencor's unique 5D™ patterning control solution, which addresses five elements of patterning process control—the three geometrical dimensions of device structures, time-to-results and overall equipment efficiency. The 5D patterning control solution is being developed to drive optimal patterning results through the characterization, optimization and monitoring of processes inside and outside the lithography module. By combining these measurements with intelligent feedback and feed forward process control loops, this solution can help chipmakers obtain faster, more cost-effective ramps of multi-patterning, spacer pitch splitting and other advanced patterning technologies using existing process equipment.



KLA-Tencor Introduces Key Systems for 5D™ Patterning Control Solution (NASDAQ:KLAC)